Wafer level system for producing burn-in/screen, and reliability evaluations to be performed on all chips simultaneously without any wafer contacting

ABSTRACT

A wafer level system for producing burn-in, voltages screen, and reliability evaluations which are to be performed on all wafers simultaneously without necessitating the probe contacting of any wafer during burn-in/stress. Also provided is a method for implementing the wafer level product burn-in/screen, and semiconductor reliability evaluations on semiconductor chips pursuant to the wafer level system. Pursuant to a preferred aspect all chips of a wafer are stressed simultaneously without having a probe physically contact any chip during the stress procedure. This concept can be applied to burn-in of product wafers, voltage screen of product wafers, and reliability evaluations of various failure mechanisms.

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to a wafer level system forproducing burn-in, voltages screen, and reliability evaluations whichare to be performed on all wafers simultaneously without necessitatingthe contacting of any wafer. More particularly, the invention alsorelates to method for implementing the wafer level productburn-in/screen, and semiconductor reliability evaluations onsemiconductor chips pursuant to the wafer level system.

[0003] In order to reduce the extent of any reliability failure ratewhich may be encountered during the early life of integrated circuits,semiconductor VLSI/ULSI products are usually subjected to burn-in ortemperature/voltage screens that are designed to screen out any presentor potential failures due to manufacturing defects, which otherwise mayoccur at an early time during field operations. The burn-in is normallycarried out at the packaged level of individual product chips, wherebyeach product wafer is initially diced out and each product chip ismounted in a package which could be constituted of plastic or ceramic.The individual packaged product chips are then mounted on customdesigned circuit boards, and these boards are thereafter placed inburn-in chambers where temperature are readily controlled to up to 140°C. or even higher. These circuit boards are custom designed for eachtype of product or product family (e.g. SRAM, DRAM, LOGIC . . . ) wherethe power supply pin or pins on each product chip package is or areenergized through the power supply buses provided on the printed circuitboard or card. Moreover, the data and address pins or the product chipsare connected through special buses to externally supplied data andaddress lines.

[0004] Consequently, through the application of this package levelstress system, many product packaged chips are placed under the burn-inprocess for a period that can readily range from about 2 hours up to 24hours, or even lengthier periods of time. During the burn-in process,the integrated product chips are dynamically stressed under elevatedvoltage and temperature conditions. Across the extent of the industry,it has been recognized, for some users, that the presently employed andgenerally conventional burn-in procedure is quite expensive andresultingly contributes significantly to the overall cost of theproduct, however, at the same time it is deemed to be an importantprocedure which semiconductor manufactures must necessarily implement inorder to sell product chips possessing a good reliability, but whichmeans having to sell them for more money. The high cost of burn-in stemsfrom the need for custom designed stress cards for each product, productfamily, package or package type, and the need for furnishing hightemperature stress chambers which are custom built with the provision ofstressors able to exercise each product dynamically and in a mannerwhich closely controls the magnitude, and timing of the various supplypins, data buses and address signals. A considerable amount of labor andexpenditure of money is involved in the process of implementing thedesigning, building, and maintaining those stressors and stress boards,as well as conducing of the burn-in procedure. There is also encounteredthe problem of low burn-in efficiency and burn-in escapes, representedby those particular chips which are not imparted a proper or adequateburn-in on a given stressor system, for example, due to broken pins,faulty connections, and inadequate handling of the packaged chips.

[0005] Another important procedure which semiconductor manufacturerscarry out in order to improve upon encountered premature or earlyfailure rate is a voltage screen, which involves applying a high voltageat a moderate temperature for a period of only a few seconds or thelike. The voltage can be applied statically or in a dynamic manner.

[0006] These screens are usually implemented at wafer level, by means ofa probe contacting one wafer at a time. For the screens, the temperaturecannot be as high as desired, because of possible probe contact problemsat high temperature. The problems with the present system for voltagescreens are; firstly the cost involved with probe contacting only onechip at a time, and secondly, the necessary temperature limitations.

[0007] In addition to the foregoing difficulties encountered in thetechnology, the performance of semiconductor technology reliabilityevaluations for the various reliability failure mechanisms, duringtechnology development represents another source of excessively highcost and time factors with regard to the overall test program budget.Normally, the reliability failure mechanisms which are usually evaluatedinclude: electromigration, dielectric reliability, hot carriers, biastemperatures stability, vias and contacts. These reliability failuremechanisms are normally evaluated in an individual manner, employingspecially designed test structures, test and stress conditions for eachmechanism. Many, if not all, of the reliability failure mechanisms areevaluated at wafer level, by probe by singly contacting each chipone-at-a-time in order to perform the required stress procedure. It isalso important to note, that for every failure mechanism, many differenttest structures are specifically designed to carry out only a specificpurpose, such as a specific type of device layout, certain specificdesign dimensions, or to perform a predetermined design function. Theindividual test structures (or test macros) are usually closely packedinside the test chip, with sufficiently small probe pad sizes, such thatnormally only one test structure, (or macro) is probed and stressed anany given instance of time. Consequently, stressing all of the requiredtest structures for all the reliability failure mechanisms is a verytime consuming and intensive process, and represents a substantialportion of the overall development costs. Each evaluation of a specificreliability mechanism, requires certain stress conditions, such as aconstant current at elevated temperatures for electromigration anddielectric reliability, a constant voltage at low or elevatedtemperatures for hot carriers, a bias temperature stability, anddielectric reliability. Thus, were it possible to be able to supplycertain current or voltage conditions on each test structure, it wouldbecome possible to evaluate many mechanisms simultaneously, since therecould be employed a common temperature for conducting the stress forthose mechanisms.

[0008] In manufacturing, routine in-line reliability monitoring is anabsolute requirement in order to protect the quality and reliability ofshipped products. This monitoring is implemented for many, if not forall of the key reliability failure mechanisms. The monitoring forreliability failure mechanisms has to be carried out such that thestress time involved in the evaluation is sufficiently short, so thatthe routine testing for adequate numbers of samples is economical in itsapplication. The testing on each wafer is done for a certain number ofchips, by the probe contacting each chip one at-a-time. For high volumemanufacturing production, the number of wafers monitored for reliabilityis very high, such that the total time required to perform the stresstesting on all chips becomes quite significant. However, in the eventthat the stress testing can be performed on many or all chipssimultaneously, that would represent a significant saving in the overalltime required for that purpose.

[0009] 2. Discussion of the Prior Art

[0010] Although a considerable amount of investigative work has beencarried out in the technology in connection with wafer level burn-in,particularly for all chips simultaneously, the currentstate-of-the-technology still does not clearly provide for a unique andadvantageously implementable wafer level system analogous to thatdisclosed by the present invention.

[0011] In the present state-of-the-technology, there are many patentswhich direct themselves to for wafer level burn-in of all chipssimultaneously; however they are all based on systems or structureswhich enable making common connections to all chips on the wafer, andthose common connections are accessible through pads to externalexercises for burn-in procedures. All of the concepts used for thisprior art require complicated systems with difficult requirements oftolerances, thermal properties and matching properties. Also, theseprior art publications would not be satisfactory for very high frequencychip technology because of the need for additional off chip contactingfixtures.

[0012] Among the foregoing patents which are considered to be of generalinterest, but which are not applicable to the inventive concept as setforth and claimed herein are Leas, et al. U.S. Pat. No. 5,600,257;Charlton, et al. U.S. Pat. No. 5,528,159; Anschel, et al. U.S. Pat. No.5,420,520; Campbell, et al. U.S. Pat. No. 5,399,101; Smith, et al. U.S.Pat. No. 5,047,711; Kreiger, et al. U.S. Pat. No. 5,210,485; Devereaux,et al. U.S. Pat. No. 5,279,975; Chiu U.S. Pat. No. 5,307,010; Rostoker,et al., U.S. Pat. No. 5,389,556; Green, et al. U.S. Pat. No. 5,424,651;King, et al. U.S. Pat. No. 5,440,241; Rostoker, et al. U.S. Pat. No.5,489,538; and Atkins, et al. U.S. Pat. No. 5,570,032.

[0013] There are also patents and other publications in evidence whichdisclose methods and systems that allow contactless testing of all chipson a wafer simultaneously without having to probe each chip at a time.It should be noted, however, that those prior art publications areprimarily for initial device characterization and measurements, and notfor burn-in, voltage screen, or reliability evaluations of failuremechanisms.

[0014] Thus, Verkuil U.S. Pat. No. 5,216362, which is commonly assignedto the present assignee, discloses a system intended to measureepitaxial dopant profile in semiconductor wafers in a non-contactingprocedure. This is achieved by forming a temporary P-N junction in thesurface of the semiconductor wafer using Corona discharge.

[0015] Verkuil et al. U.S. Pat. No. 4,812,756 is concerned withdisclosures of a contactless technique which allowed for making timeretention and epi-doping concentration measurements.

[0016] In Verkuil U.S. Pat. No. 5,485,091 a contactless system isemployed for measuring the thickness of very thin oxide layers on asilicon substrate. This is effected by a Corona discharge source whichrepetitively deposits a calibrated fixed charge density on the surfaceof the oxide, and the resultant change in oxide surface potential foreach charge deposition is measured. In Verkuil U.S. Pat. No. 5,442,297),a contactless system is described which measures the sheet resistance ofa desired layer of a first conductivity type formed upon a substrate ofan opposite conductivity type. The apparatus comprises a junctioncapacitance establishing means, a point location alternating current ACphotovoltage, an attenuation and phase shift monitoring means formonitoring the laterally propagated AC photovoltage, and a sheetresistance signal generating means responsive to the junctioncapacitance establishing means, the AC photovoltage generating means,and the attenuation and phase shift monitoring means for generating anoutput signal indicative of a sheet resistance.

[0017] Also set forth in a copending U.S. patent application Ser. No.09/250,880, W. Abadeer, et al. entitled “Apparatus and Method forNon-Contact Stress evaluation of Wafer Gate Dielectric Reliability”, isa wafer contactless system for gate dielectric reliability stressevaluation. In the system described therein, exposure of wafer tohydrogen plasma was shown to induce degradation in the thin gatedielectric, and this degradation was correlated and related to thesystematic process of thin gate dielectric degradation, leading tobreakdown under conventional voltage/temperature stressing with probecontacting.

[0018] In this prior art, wherein wafers are exposed to the hydrogenplasma and the change in interface state density due to hydrogenexposure is measured. That system, however, cannot be used for fullyprocessed and integrated wafers with metal levels because the lateraltransport of atomic hydrogen in metal-oxide-semiconductor capacitorswith aluminum or polysilicon gates is extremely limited. This means thatthe evaluation for gate dielectric reliability need to be done on gatefree samples after the deposition of the thin gate dielectric, withoutdepositing an polysilicon or metal levels. Also the technique can not beused for evaluation of other reliability failure mechanisms such as hotcarriers, electromigration and bias temperature stability. It alsocannot be used for burn-in of product chips.

SUMMARY OF THE INVENTION

[0019] Accordingly, in order to obviate the drawbacks and limitationsencountered in the prior art, the present invention provides for a novelsolution implementing the wafer level system of the type as describedherein.

[0020] A novel solution to the above problems encountered in thetechnology is presently by the present invention. The solution is basedon a technique through the intermediary of which all chips of a waferare stressed simultaneously without having a probe physically contactany chip during the stress procedure. This inventive concept can beapplied to burn-in of product wafers, voltage screen of product wafers,and reliability evaluations of various failure mechanisms.

[0021] The object of the present invention is predicated on creating thenecessary voltage bias conditions by inducing the voltage for a loop orcircuit, using a time varying magnetic field that is fixed with respectto the circuit loop, according to Faraday's law. The induced voltage isachieved at a top layer of a special mask to be placed on the productwafer. Connections are made to the chip by the special mask for burn-in,and this additional mask can be re-used for burn-in of other wafers, anddoes not interfere with the normal operation of the chip.

[0022] Accordingly, an object of the present invention is to provide amethod which generates a controlled burn-in voltage and procedure onproduct chips for all chips on a wafer simultaneously without any probecontacting each chip at any time.

[0023] Another object of the invention resides in the provision of asystem to achieve the contactless controlled burn-in voltage inaccordance with the inventive method.

[0024] A more specific object resides in the provision of a system whichachieves particular objects of the contactless burn-in and utilizing themethod and system pursuant to the invention.

[0025] Another object of the invention resides to the provision ofarrangement of achieving an economical and practical aspect of supplyingthe generated burn-in voltage to each chip for the case of P− siliconsubstrates.

[0026] Another object of the present invention resides in providing anarrangement of achieving an economical and practical system forsupplying the generated burn-in each chip for the case of P+ siliconsubstrates.

[0027] Yet another object of the present invention resides in providinga system which will perform reliability evaluations for multiplereliability mechanisms and all chips of a wafer or wafers simultaneouslywithout a probe contacting each chip at any time.

[0028] Furthermore, pursuant to the invention another object resides inthe provision of a system as described herein utilizing an interposerwhich facilitates contact with the wafer surface which may beconstructed in a manner of a decal.

BRIEF DESCRIPTION OF THE ACCOMPANYING DRAWINGS

[0029] Reference may now be made to the following detailed descriptionof preferred embodiments of the invention, taken in conjunction with theaccompanying drawings; in which:

[0030]FIG. 1 illustrates a representation of an induced voltage by atime varying magnetic field within a specified area;

[0031]FIG. 2 illustrates a top view of a metal line around the area ofFIG. 1 to induce voltage;

[0032]FIG. 3 illustrates a side view representative of a first magneticsystem, including a magnetic core with an air gap;

[0033]FIG. 3a illustrates a top plan view of a first magnetic systempursuant to the invention;

[0034]FIG. 4 illustrates a cross-section of the magnetic core;

[0035]FIG. 5 illustrates a first magnetic system extended to a pluralityof wafers;

[0036]FIG. 6 illustrates a top plan view of a second magnetic systempursuant to an example of the invention;

[0037]FIG. 7 illustrates an exemplary representation of utilizing thesystem to perform a test for gate reliability for failure mechanism;

[0038]FIG. 8 illustrates a system for generating signals required forchip functional burn-in/screen; and

[0039]FIGS. 9 and 10 diagrammatically each illustrate processing systemsfor respectively, P+ silicon and P− silicon substrates mounting thewafers, pursuant to the invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENT

[0040] The solution to the problems in the prior art, as presented bythe present invention, is based on Faraday's law that gives the electricfield, and hence voltage, which is induced by a time rate of change of amagnetic field for a loop circuit which is fixed with respect to themagnetic field. The loop 10, as shown in FIGS. 1 and 2, is a fixedrectangular loop 10 of area A and the flux density B is normal to theplane of the loop (FIG. 1) and is uniform over the area of the loop. Themagnitude of B varies harmonically with respect to time as given by:

B=B _(o) cos ωt  (1)

[0041] The induced voltage V is given by:

V=(dB/dt)A  (2)

[0042] Where (dB/dt) is the time rate of change for the magnetic field.Substituting with equation (1) into equation (2), one obtains:

V=AωB _(o) sin ωt  (3)

[0043] The induced voltage follows from the Maxwell's Equation, oftenreferred to as Faraday's law. For this invention, the value of B_(o)ranges from 10 Gauss to about 50 Gauss, with a typical operating valuefor this invention of 20 Gauss. The frequency f for the time varyingmagnetic field varies from 0.8 MHz to about 5 MHz with a typicaloperating value for this invention of 2 MHz. The area A of the loop 10ranges from 0.8 cm×0.8 cm to about 1.3 cm×1.3 cm, with a typicaloperating point for this invention of 1 cm×1 cm or 1 cm². Thus,substituting with the given design values for this invention in equation(3), one obtains:

V=2.51 sin ωt (Volts)  (4)

[0044] Thus, the maximum generated voltage for this design point is 2.5V which would be suitable for ultra thin gate dielectric CMOStechnologies. The range of the maximum value of the induced voltage V isfrom 2 volts to about 5 volts, with a typical preferred operating valuefor the present invention of 2.5 volts. The loop 10 with the area A isplaced using a special mask processing on the top of the integratedchip, and with details of the special mask system being describedhereinbelow. The top view of the loop 10 is shown in FIG. 2 for the casedemonstrated in the invention, where one loop per chip is used, and theloop 10 has only two points 12,14 (ends) for making connections with thechip. The width W of the loop 10 ranges from 240 μm to 620 μm, with atypical operating value employed for the invention of 400 μm . The widthW of the metal line 16 forming the loop 10 is such that the resistanceof the total loop and, hence the voltage drop in the line 16 forming theloop is sufficiently small as compared with the generated inducedvoltage V. The metal forming the loop 10 is typically made of copper;however it can also be constituted of aluminum.

[0045] In order to produce the time varying magnetic field, twodifferent systems are described in connection with the invention. Thetwo systems are designed to achieve certain advantages or certainoperating conditions.

[0046] The first system 20 described in this invention is shown in FIGS.3 and 3A for the case where one wafer is subjected to burn-in. thesystem shown in FIG. 3 is a magnetic circuit with air gap 22, and thewafer 24 is placed in the air gap, preferably mounted on a wafer holder25 of a dielectric material. The circular magnetic core 26 is made ofPermalloy powder, with a composition of 2% Mo and 81% Ni by weight, andthe remainder is iron and impurities (see “Electromagnetic” 1984,Section 6-4, page 216, Table 6-1, ibid), and a relative permeability,μ_(r) of 130. The air gap 22 of the magnetic circuit is such as to coveran 8 inch diameter wafer 24, such as is currently used in semiconductormanufacturing. However, it should also be noted that this system 20 isextendible to other contemplated wafer sizes in excess of 8 inches indiameter. The cross section of the circular magnetic circuit is shown inFIG. 4, and has a radius r_(g) of 4 inches or 10.16 cm, and a crosssectional A_(c) of 324.3 cm². The magnetic core of FIG. 3 has a radiusr_(c) of 54.38cm, the length d_(c) of the circumference of the magneticcore is 341.68 cm, and the length d_(g) of the air gap is 2 cm. Themagnetic field lines (B) follow the magnetic core 26 and areperpendicular to the wafer surface at the air gap 22. Thus, for any chipon the wafer 24, as shown in FIG. 2, there will be induced a voltage Vwhich is produced at the terminals of the loop with area A which isplaced on the top of the chip. The magnetic circuit of FIGS. 3 and 3A,is energized by N1 turns of an isolated electrical wire 30 which isconnected in series with a capacitance C1 and a time varying voltagesource 32 of the following voltage source amplitude:

V _(s1) =V ₁ sin ωt  (5)

[0047] The inductance of the coil 34 of wire 30 with N1 turns is givenby article “Electromagnetic” 1984, Section 5.13, page 166, ibid:

L ₁=(μ_(o)μ_(r) N1² A _(c))/d ₁  (6)

[0048] where d₁ is the total length of the coil with N1 turns, and μ_(o)is the permeability of free space (8.854×10⁻¹², Henry/m). d₁ is givenby:

d ₁ =N1×2×π×r _(g)  (7)

[0049] The current I_(s1) generated in the coil by the voltage source isgiven by:

I _(s1) =I ₁ sin ωt  (8)

[0050] The magnetic flux density B generated in the air gap 22 of themagnetic circuit is given by (Applied Electromagnetics, Martin A. Pimus;McGraw-Hill Book, Co., 1978, Section 10.5, page 406):

B=B _(o) sin ωt=μ _(o) N1I ₁/(d _(g) +d _(c)/μ_(r)) sin ωt  (9)

[0051] Substituting with the values d_(g), d_(c), B_(o),μ_(o) and μ_(r)in equation (9), one obtains a value for the product N1.I₁ given by:

N1.I ₁=73.7 Ampere-turns  (10)

[0052] The value of N1 for this invention is two (2) turns, with a rangeof 1 to 4 turns. Thus the value of the peak amplitude of the current I₁is 36.85 Amperes, and the range of I₁ is 20 Amperes to 60 Amperes.Substituting with the value of N1 in equation (7), one obtains a valueof 1.277 meters for the length d₁. Substituting with the values ofμ_(o), μ_(r), N1, d₁, and A_(c) in equation (6), one obtains a value of16.6 μHenry for the coil inductance L₁. The coil 34 with N1 turns ismade of copper wire strands with a total diameter of 5 mm. The totalresistance of the copper wire coil R1 is much less than one Ohm. Thecapacitance C1 in FIGS. 3 and 3A for the magnetic circuit is to providea resonant circuit with the inductance L₁. Thus the capacitance C₁ isgiven by (frequency is 2 MHz):

C1=1/(ω² L ₁)=381.5 Pico Farad  (11)

[0053] The peak amplitude of the voltage V₁ is such as to provide thecurrent I₁ to the coil with N1 turns. Thus the value of V₁ is given by:

V ₁ =R _(s1) I ₁  (12)

[0054] The resistance R_(s1) is the total resistance of the magneticcircuit in FIGS. 3 and 3A, comprising the coil with N1 turns, thecapacitance C1, and the voltage source V_(s1). The Q1 factor (Qualityfactor) for the coil inductor is calculated from:

Q1=ωL ₁ /R _(s1)  (13)

[0055] From equation (13) one obtains a value in excess of 200 for thecoil quality factor. The value of V₁ is adjusted according to the totalresistance of the magnetic circuit, R_(s1). Typically the totalresistance R_(s1) will be about 0.5 Ohms or less, and thus V₁ will beabout 118 Volts or less. This magnetic system, as mentioned, is for thecase where one wafer at a time is subjected to burn-in, and thus thepower requirements of this magnetic system 20 is not large. It should benoted that this magnetic core with air gap system can also be extended,as described hereinbelow, to the case of multi wafer burn-in system. InFIG. 3, the wafer and the decal mask on top of wafer are placed as showninside the air gap of the magnetic core system. Reiterating theforegoing, the cross-section of the circular magnetic system, as shownin FIG. 4, has a radius r_(g), and a cross sectional area of A_(c). Thecircular magnetic core of FIG. 3 has a radius r_(c), and the length ofthe circumference of the circumference of the magnetic core is d_(c).The length of the air gap is d_(g). The coil with N1 turns is connectedto the voltage source V_(s1), in series with a capacitance C1, and aresistance R_(s1), which represents the total resistance of the magneticcircuit, including the coil and any other external resistance connectedin series with the capacitance C1. The capacitance C1 is to provide aresonant circuit with the inductance L₁ of the coil. The quality factorfor the resonant circuit is Q1. The frequency of the voltage sourceV_(s1), is f, and the peak magnitude (time varying with frequency f) ofthe magnitude flux density at the air gap is B_(o). The magnetic fluxlines are incident perpendicular to the surface of the decal mask andgenerate a time varying voltage V between the terminals of a loop at thesurface of the deal mask (referring FIG. 1), where the area of the loopis A. The top view of the loop is shown in FIG. 2 for the case in thisinvention where only one loop per chip is used, and the loop has onlythe two end points for making connections to the chip through the decalmask (referring to FIGS. 9 and 10). The width of the loop is W is suchthat the resistance of the total loop, and hence the voltage drop in theline forming the loop is sufficiently small as compared with thegenerated induced voltage V. The metal forming the loop is preferablymade of copper; however it could also be made of aluminum.

[0056] In the following, there are set forth the preferred designedvalues, and ranges for all dimensions, operating variables andparameters:

[0057] f=2 MHz, with a range of 0.5 MHz to 5 MHz.

[0058] A=1 cm²,with a range of 0.64 cm² to 1.69 cm²

[0059] B_(o)=20 Gauss (peak value), with range of 10 Gauss 50 Gauss

[0060] V=2.5 Volts (peak value), with a range of 2 Volts to 5 Volts.

[0061] W=400 μm, with a range of 240 μm to 620 μm

[0062] r_(g)=4.5 inches with tolerance of +/−0.30 inches. This is forthe case of 8 inches diameter wafers.

[0063] A_(c)=63.62 inches², with a tolerance of +8.76 inches², and −8.2inches².

[0064] r_(c)=21.4 inches, with a tolerance of +/−1.28 inches

[0065] d_(c)=134.5 inches, with a tolerance of +/−8.1 inches.

[0066] d_(g)=0.79 inches, with a tolerance of +/−0.05 inches.

[0067] N1=2 Turns, with a range of 1 to 4 Turns.

[0068] I₁=36.85 Amperes, with a range of 20 Amperes to 60 Amperes

[0069] d₁=1.436 meters, with a tolerance of +/−0.096 meters

[0070] L₁=14.75 μHenry, with a range of 7.4 μH to 29.5 μH.

[0071] d_(w)=5 mm, with a tolerance of +/−0.5 mm.

[0072] R₁<<1 Ohms

[0073] C₁=429.3 pF at 2 MHz, with a range of 214.7 pF to 858.6 pF

[0074] R_(si) =0.5 Ohms or less

[0075] Q1 >200

[0076] V₁=18 Volts, with a range of 10 Volts to 30 Volts (

[0077] The magnetic circuit of FIGS. 3, 3A and 4 can be extended, asshown in FIG. 5, to apply to the case of the burn-in of multiplicity ofa wafers simultaneously in a contactless manner. The system 40 shown inFIG. 5 is an extension of FIG. 3, where the magnetic core 42 has severalarms 44, whereby each arm is energized by a coil 46 of N1 turns, andthere are provided several air gap 48, in which a wafer 50 is placed ineach respective air gap 48. In order to calculate the power capabilityof this magnetic system 40, first the total input peak power supplied bythe supply voltage V_(s1) is given by:

P _(in) =V ₁ ×I ₁=18 ×36.85=633 Watts  (14)

[0078] The power that is dissipated by all the chips on a wafer duringthe burn-in procedure is given by:

[0079]P _(d)=90 (chips/wafer)×2.5 (induced voltage)×I _(burn-in)  (15)

[0080] where I_(burn-in) is the current supplied to each chip duringburn-in, which is about 0.3 Amperes for a high density SRAM chip (4Mbit), and could be less than that for DRAMs. Substituting in equation(15), one obtains a value of 67.5 Watts for the dissipated power by awafer during burn-in at 140°C. Comparing the values of input power(P_(in)=663 Watts), and the dissipated power (P_(d)=6.75 watts), oneobtains a value of about 10% efficiency required of themagnetic/electric system to perform the burn-in operation on one wafer.If it is necessary to achieve the desired and sufficient power forburn-in, several coils, each with N1 turns, and each coil is supplied bya separate voltage source V_(s1), and whereby current I_(s1), couldreadily be used around the magnetic core. This could also be used forthe simultaneous contactless burn-in of a multiplicity of wafers.

[0081] Described hereinbelow is the second magnetic system forutilization pursuant to the invention as shown in FIG. 6 which detailsthe top view of the second magnetic system 60 which is composed of arectangular core 62 of non-magnetic material (relative permeability,μ_(r) is one). The core 62 could be made of a variety of materials, withwood being the preferred material because of weight and costconsiderations. A coil 66 with N2 turns made of electric wire, is woundaround the rectangular core. Various dimensions are shown in FIG. 6,with tolerances of 6% or better being acceptable. As shown in FIG. 6, upto 9 wafers 68 are placed horizontally in the center of the rectangularcore 62, with a decal mask 70 on top of each wafer 68. FIG. 6 is anillustration for the use of this second magnetic system using 8-inchdiameter wafers which are currently used in manufacturing; although thesystem of FIG. 6 could easily be extended to cover any wafer size. Alsoshown in FIG. 6, the decal mask 70 placed on top of each wafer 68 whichprovides a means for supplying the generated voltage to the chip underthe decal mask. The coil around the non-magnetic core has a total lengthof d₂, and inductance of L₂, and is made of copper wire strands with atotal diameter of D_(W), and the total resistance of the coil is givenby R2. As shown in FIG. 6, wires 72 from the decal masks 70 are run tothe sides and connected to a panel 74 for direct measurements andverification of the generated voltages on each wafer 68. The coil isconnected in series with a capacitance C2, and a resistance R_(S2), to atime varying voltage source V_(S2), which has a frequency of f1, and apeak magnitude of V₂. The resistance R_(S2) represents the totalelectric resistance of the coil, the capacitance C2, the voltage sourceV_(S2), and any additional series resistance placed in the circuit. TheAC current generated in the coil is I_(S2), which has a frequency of f1,and a peak amplitude of I₂. The current in the coil generates a magneticfield perpendicular to the surface of each wafer 68 placed in the centerregion of the non-magnetic core 62. The generated AC magnetic field hasa frequency of f1, and a peak magnitude of B₁. The magnetic field isincident perpendicular at the surface of decal mask on top of eachwafer, where there is a wire loop of width W, and an enclosed area A.The generated AC voltage at the terminals of the loop is V.

[0082] f1=0.4 MHz, with a range of 0.2 MHz to 0.8 MHz.

[0083] A=1 cm², with a range of 0.64 cm² to 1.69 cm²

[0084] B₁=100 Gauss (peak value), with a range of 50 Gauss to 200 Gauss.

[0085] V=2.5 Volts (peak value), with a range of 2 Volts to 5 Volts.

[0086] W=400 μm, with a range of 240 μm to 620 μm

[0087] I₂=250 Amperes, with a range of 150 Amperes to 350 Amperes.

[0088] N2=64 Turns, with a range of 38 Turns to 90 Turns

[0089] d₂=512 meters, with a range of 304 meters to 720 meters.

[0090] L₂=40 μ Henry, with a range of 23.8 μ Henry to 56.3 μHenry.

[0091] R_(s1)=0.5 Ohms or less

[0092] D_(w)=10 mm, with a tolerance of +/−1.0 mm.

[0093] R1<<1 Ohms

[0094] C₂=3.96 Nano Farad, with a range of 2.36 Nano Farad to 5.57 NanoFarad.

[0095] V₂=125 Volts, with a range of 75 Volts to 175 Volts.

[0096] The rectangular core 62 is 2 meters×2 meters in dimensions;whereby up to 9 wafers can be placed in the center of the rectangularcore, as shown in FIG. 6. The coil with N2 turns is connected in serieswith a capacitance C2 to a time varying voltage source with an amplitudegiven by:

V _(S2) =V ₂ sin (ω1.t)  (16)

[0097] Frequency f1 for this magnetic system has the value of 400KCycles/Seconds for this invention, with a range of 200 Kc/s to about800 Kc/s. From equation (3), to obtain the same value of he maximuminduced voltage V of 2.5 Volts, for the same area A as before which is1.0 cm×1.0 cm, one needs to increase the maximum value of the timevarying magnetic field density B_(o) from 20 Gauss (which was used inthe first magnetic system 20) to the following value:

B ₁ =B _(o) ×f/f1  (17)

[0098] which means that the maximum value of the magnetic field densityfor this second magnetic system 60 is about 100 Gauss, with a range of50 Gauss to 200 Gauss. The current in the could with N2 turns is givenby:

I _(S2) =I ₂ Sin (ω1.t)  (18)

[0099] The maximum value of the magnetic field density in the center ofthe core for this system is approximately given by Electromagnetics,1984, Section 5-6, page 155, ibid. This is only an approximation,intended to demonstrate the operation:

B ₁=μoI ₂ N2/(2×a)  (19)

[0100] where a is the distance from the center of the core (at wafers)to the side of the core (about 1 meter). Substituting with the values ofB1, μ_(o) and a, one obtains the following:

N2×I ₂=15.92×10³ Ampere-turns  (20)

[0101] For this second magnetic system 60, the maximum value of thecurrent I2 is set at 250 Amperes, with a range of 150 Amperes to 350Amperes. Thus the number of turns N2 required for the second magneticsystem is about 64 turns, with a range of 38 turns to 90 turns. Thetotal length of the coil with N2 turns is given by:

d ₂ =N2×(2×4) Meters  (21)

[0102] which given a value of 512 meters for d₂. Similarly to equation(6), the inductance L₂ is calculated to be about 40 Henry. Thecapacitance C2 is to provide a resonant system with the inductance L₂.Thus the value of the capacitance is given by:

C2=1/(ω1² ×L ₂)  (22)

[0103] Thus for a frequency of 400 Kc/s for this second system, C2 iscalculated to be about 3.96 Nano Farads. The coil with N2 turns is madeof copper wire strands with a total diameter of about 10 mm. The totalresistance of the coil is less than 1 Ohms. The maximum value of thevoltage source V₂ is adjusted such that the maximum value of the currentin the resonant circuit is I2 which is set to a design value for thisinvention of 250 Amperes. Thus V_(S2) is given by:

V _(S2) =I ₂ .R _(S2)   (23)

[0104] Thus for a total resistance R_(S2) of the resonant circuit of 0.5Ohms, the value of V_(S2) is about 125 Volts. The quality factor Q forthis circuit is about 200. To calculate the power capability of thissecond magnetic system, first the total input peak power supplied by thepower supply V_(S2) is calculated as follows:

P _(in) =V ₂ ×I ₂  (24)

[0105] Substituting for V₂ (125 Volts) and I₂ (250 Amperes), one obtainsa value of 31,250 Watts for total supplied power. The total powerdissipated by 9 wafers at 140° C., during burn-in is calculated asfollows:

P _(d)=9(wafers)×90(chips/wafer)×2.5 (induced voltage)×I_(burn-in)  (25)

[0106] where I_(burn-in) is the current supplied to each chip at 140° C.during burn-in, which typically is about 2.0 Amperes for ASICS productsor microprocessors. Substituting in equation (25), one obtains a valueof 4,050 Watts for the power dissipated. Comparing the values of P_(in)(21,250 Watts), and Pd (4,050 Watts), one obtains a value of about 13%efficiency required for the magnetic/electric system. If it is necessaryto achieve the desired power for burn-in of many wafers, several coils,each with N2 turns could be placed around the core, and each coil issupplied with a separate voltage source VS2, and current IS2 so thatsufficient magnetic field is induced at the wafers.

[0107] The induced voltage V could be used to perform the reliabilityevaluations of various failure mechanisms for many wafers simultaneouslywithout probe contacting of any chip. Also more than one test structure(macro) and more than one failure mechanism can be evaluated on the samewafers simultaneously, which other wise would have to be done, onemechanism and one structure at a time in the conventional probecontacting method of one chip at a time. An example of the system to beused of the reliability evaluation of the thin gate dielectric breakdownis shown in FIG. 7. The induced voltage V is produced at the specialmask level at the top of the chip, and is propagated down to the chipupper metal wiring level. First, the time varying voltage V is rectifiedusing an N+/P substrate diode of an area equal to or larger than 400μm×400 μm. For burn-in currents in the high range, several diodes ofthis size would be required, also a voltage smoothing circuit willensure that that DC produced voltage will be almost constant. As shownin FIG. 7, the gate and diffusions of the test structure (to bestressed) are connected to test pads at top metal level of theintegrated chip. For this invention, the gate pad of the device undertest is also connected to the diffusion of a NFET (D1). The gate ofdevice D1 is powered to the DC rectified voltage of the induced voltageV. The other diffusion of device D1 is also connected to the rectifiedvoltage, which, because device D1 will be “ON”, is the stress voltageapplied to the gate of the device under test. Under normal operationwith no applied magnetic field, and no induced voltage V, the gate ofdevice D1 will have no voltage on it, which means that device D1 will be“OFF”, and thus the gate of the device under test will be floating (noforced connection), so that normal external probing can be accomplishedin normal way. Similarly, the diffusion pads of the test structure (tobe stressed) are connected to one diffusion of a NFET (D2). The gate ofdevice D2 is connected to the rectified of the induced voltage V, whilethe other diffusion of device D2 is connected to GND. Under theapplication of the magnetic field, and the production of the inducedvoltage V, the gate of device D2 will have a voltage on it, which meansthat device D2 will be “ON”, and the diffusions of the test structureunder stress will be connected to “GND” as it is supposed to. On theother hand, under normal operation with no magnetic field, the gate ofdevice D2 will have zero voltage on it, which means that device D2 willbe “OFF”, and the diffusion of the test structure will be floating (noforced connections), so that normal external probing can beaccomplished. All other stress configurations for the various failuremechanisms can be similarly accomplished.

[0108] There are now described the operations performed on theintegrated chip to utilize the induced voltage V in order to accomplishthe burn-in function. As shown in FIG. 8, the induced voltage V at thetop of the chip by the time varying magnetic field, is propagated to thetop metal level of the integrated chip, using special mask levels whichwill be discussed later. The voltage V which is time varying with afrequency as described above, is rectified, as shown in FIG. 8, using anN+/Sx diode with an area of at least 400 μm×400 μm, and several diodesmay be necessary for high currents. Also the produced DC rectifiedvoltage is processed through smoothing circuits to produce an almostconstant power supply voltage for the burn-in operation. To perform theburn-in procedure, an on-chip integrated system similar to the one shownin FIG. 8 can be used. As shown in FIG. 8, the produced DC voltage isapplied to specially designed drivers to generate the signals requiredfor functional exercise of the integrated chip (data signals). Alsoaddress signals are generated for cases of SRAM and DRAM chips, as wellas necessary phase shifters to produce the desired phase between thevarious data signals. In conventional burn-in, these data, address, andcontrol signals would be supplied externally to the chip through thestressor equipment. Also in some cases it would be possible to includein the design of the integrated chip, special circuits for self test ofevery chip as means of accomplishing in-situ testing at stressconditions. The test data can be stored on each chip using non-volatilememory technology. Otherwise, intermediate time testing of the waferswould have to be accomplished by stopping the magnetic field, and probetesting of each chip in a conventional manner.

[0109] The following describes the procedure for the processing and themask levels to measure and propagate the induced voltage to every chipof the wafer; having reference to FIGS. 9 and 10. Two systems aredescribed, one general system (FIG. 9) more suited for P-substrates likeDRAM where it would be safe to propagate the magnetic field lines to thesubstrate. The second system (FIG. 10) is suited for P+substrates wherethe magnetic field lines are blocked, by means of a grounded metalplane, from reaching the substrate.

[0110] An interposer which allows contact to the wafer substrate can bebuilt in the manner of a “decal”, as described below.

[0111] 1. A polyimide (Kapton) film (2) is rigidly affixed to a suitableframe (1) in a manner similar to that used to build x-ray masks. Theframe and film are sufficiently large to completely cover a full wafer.The frame is mechanically rigid and if desired can be imparted acoefficient of thermal expansion matched to the wafer. Examples of framematerials include, silicon, invar, stainless steel. The Kapton film istypically about 100 u thick. Attachment of Kapton to the frame isaccomplished using an appropriate adhesive.

[0112] 2. A metal film, or stack of metal films is deposited onto theKapton film by sputtering or evaporation. Deposition is on the side ofthe film opposite of the frame. A typical film stack would be comprisedof Cr/Cu/Cr.

[0113] 3. The metal film is then patterned to provide wiring lines (3)in areas that correspond to the “kerfs” (i.e. the area between theactive chips) of the associated product wafer. These wires extend to theedge of the decal as shown in FIG. 6. These wires facilitate measuringthe induced voltage. In the case of Cr/Cu/Cr, patterning can beaccomplished using conventional positive photoresist technology and asequence of etches that is appropriate for the films stack, e.g. basicpermanganate to etch the Cr, followed by ammonium persulfate as the Cuetch, followed by basic permanganate.

[0114] 4. After removal of the positive photoresist, the surface of theKapton can be cleaned and activated using an aqueous solution oftetramethyl ammonium hydroxide, typically less than 5% by weight, and apolyimide film (4) applied, e.g. a PMDA-ODA polyamic acid that isconverted to polyimide by heating.

[0115] 5. Vias can be patterned into the polyimide film usingconventional positive resist/aqueous alkali developer technology.

[0116] 6. Following patterning of the vias and thermal cure of thepolyimide, the Cr exposed in the bottom of the via is removed byetching. The now exposed Cu surface is cleaned, typically with a diluteaqueous solution of sulfuric acid and a 2nd wiring layer (5) isdeposited and imaged inthe same manner as the 1^(st) wiring layer (3).

[0117] 7. The 2^(nd) wiring layer creates the “ring wire loop” that isplaced over the active area of each chip. Each “ring wire” is connectedto a 1^(st) level “kerf” wire that extends to the perimeter of thedecal. This allows an electrical bias to be placed on each “ring wire”if desired.

[0118] 8. A final layer of polyimide (6) is applied and imaged over the2^(nd) wiring level in the same manner as polyimide film (4). Vias arecreated which allow contact to the “kerf” wires at the perimeter of thedecal as well as a contact at each end of the “ring wire”. Structureshaving more layers of wires can be built by repetition. If no externalcontact is desired, a simplified wiring pattern can be built by deletingthe 1^(st) wiring layer.

[0119] 9. Lead/Tin bumps of desired height, e.g. about 100 u, are placedinto each via and metallurgically attached to the 2^(nd) layer wiring byan appropriate technique, e.g. solder ink jet printing. Typically, a lowtemperature solder (eutectic) would be used to facilitate deposition andallow reflow (reformation) of the “spherical” shape of the contact afterusage.

[0120] 10. Bump height is adjusted by volume of solder deposited. Byusing the ink jet printing technique, the bumps at the perimeter can beof different height than the bumps over the chip region of the decal.The pattern of the bumps in the interior of the decal (the chip area) isa mirror image of the wire bond pads or C4s on the chip to be “burnedin”.

[0121] 11. In use, the decal is mounted in an appropriate fixture suchthat the interior lead/tin bumps are brought into contact with the wirebond pads or C4s of the wafer to be “burned-in” and the bumps around theperimeter are brought into contact with mating contacts on the fixture.

[0122] While the invention has been particularly shown and describedwith respect to preferred embodiments thereof, it will be understood bythose skilled in the art that the foregoing and other changes in formand details may be made therein without departing from the spirit andscope of the invention.

What is claimed is:
 1. A method for electrically stressing through aspecified voltage at least one semiconductor chip on a wafer forcontrolled contactless burn-in, voltage screen and reliabilityevaluation of product wafers, said method comprising: applying saidvoltage to said at least one chip for the probing thereof in the absenceof physically contacting the chip surface; and magnetically inducingsaid voltage to said at least one chip through the interposition of amask onto which the voltage is induced and thereafter conducted toelectrical contacts on said wafer.
 2. A method as claimed in claim 1,wherein said applied voltage produces specified voltage bias conditionsby inducing the voltage for a circuit utilizing a time varying magneticfield which is fixed with respect to said circuit.
 3. A method asclaimed in claim 2, wherein an electrical field which is represented bysaid induced voltage is based on Faraday's law setting forth that saidvoltage which is induced by a time rate of change of a magnetic fieldfor said circuit which is fixed with respect to said magnetic field. 4.A method as claimed in claim 1, wherein said induced voltage is obtainedat a top layer of said mask which is positioned on said wafer; andconnections are made to said at least one chip by said mask foreffectuating said burn-in without interference with the normal operationof said at least one semiconductor chip.
 5. A method as claimed in claim2, wherein said circuit comprises a loop defining an area on a wafer,said mask being positioned on said wafer so as to enclose said area andhaving electrical contacts for an induced voltage through said timevarying magnetic field within said enclosed area.
 6. A method as claimedin claim 5, wherein said loop comprises a metallic line on said waferforming an open circuit having electrical contact points provided atopen ends of said circuit for producing said induced voltage.
 7. Amethod as claimed in claim 6, wherein said loop is of a rectangularconfiguration to define a generally rectangular area on said wafer.
 8. Amethod as claimed in claim 6, wherein said metallic line is constitutedof copper.
 9. A method as claimed in claim 6, wherein said metallic lineis constituted of aluminum.
 10. A method as clamed in claim 2, whereinsaid circuit comprises a circular magnetic core having an air gap forreceiving said wafer with said at least one chip and said maskpositioned thereon; and an electrical coil for energizing said magneticcore to produce said specified voltage bias conditions.
 11. A method asclaimed in claim 10, wherein said voltage is supplied to said electricalenergizing coil from a radio frequency voltage source.
 12. A method asclaimed in claim 11, wherein said circular magnetic core is constitutedof a Permalloy powder having a composition 2% by weight of Mo, 81% byweight of Ni with the remainder being iron and impurities.
 13. A methodas claimed in claim 10, wherein said air gap receiving said wafer andmask is adapted to provide for the burn-in of differently sized wafers.14. A method as claimed in claim 10, wherein said electrical energizingcoil consists of an isolated electrical wire comprised of copper wirestrands.
 15. A method as claimed in claim 10, wherein said wafer andmask are retained in said air gap by a wafer holder consisting of adielectric material.
 16. A method as claimed in claim 10, wherein saidmagnetic core includes a plurality of said circular magnetic coresinterconnected by arms, and each said core having an air gap forreceiving respectively a wafer and covering mask so as to facilitate thesimultaneous controlled burn-in of a plurality of said wafers.
 17. Amethod as claimed in claim 2, wherein a rectangular core of non-magneticmaterial has electrical wire coils wound thereabout, said wire coilsbeing connected to decal masks on a plurality of wafers positionedcentrally on said core, each said decal mask being provided to conduct agenerated voltage to a chip under said mask.
 18. A method as claimed inclaim 17, wherein each said coil is conducted to a time varying voltagesource so as to generate a magnetic field perpendicular to the surfaceof each said wafer in the center of said non-magnetic core.
 19. A methodas claimed in Clam 18, wherein electrical wires extend from each saidmask to a panel for the direct measurements and verification of thedirect voltages present on each of said wafer.
 20. A method as claimedin claim 17, wherein said non-magnetic core is constituted of wood. 21.A method as claimed in claim 17, wherein at least nine wafers arepositioned on each core for simultaneous burn-in thereof.
 22. A methodas claimed in claim 1, wherein said mask comprises an interposer forminga decal on said wafer surface so as to protect the surface of said waferfrom direct contact with a probe during burn-in and voltage screeningthrough electrical stressing.
 23. A method as claimed in claim 22,wherein said method conducts the generated burn-in voltage to said atleast one chip when mountable on P+silicon substrates.
 24. A method asclaimed in claim 22, wherein said method conducts the generated burn-involtage to said at least one chip when mountable on P−siliconsubstrates.
 25. A method as claimed in claim 22, wherein said interposeris formed for mounting the wafer on either P+silicon or P−siliconsubstrates by the steps of: fixing a polyimide film to a frame to fullycover said wafer; depositing at least on layer of a metallic film ontothe polyimide film; patterning said metallic film to provide wiringlines extending to the edge of said wafer to facilitate measuring theinduced voltage; removing exposed metallic layer material at the bottomof the vias and depositing a further wiring line layer forming a ringwire loop on said wafer which is connected to said first wiring lines tofacilitate applying an electrical bias to each said ring wire loop;placing lead/tin bumps into each of said vias and connecting said bumpsto said further wiring lines; and adjusting bump heights whereby thepattern of the bumps interiorly of the decal mask is a mirror-image ofwire bond pads or C4 connects on the wafer chip which is to beburned-in.
 26. A system for electrically stressing through a specifiedvoltage at least one semiconductor chip on a wafer for controlledcontactless burn-in, voltage screen and reliability evaluation ofproduct wafers, said system comprising: an arrangement for applying saidvoltage to said at least one chip for the probing thereof in the absenceof physically contacting the chip surface; and magnetically inducingsaid voltage to said at least one chip through the interposition of amask onto which the voltage is induced and thereafter conducted toelectrical contacts on said wafer.
 27. A system as claimed in claim 26,wherein said applied voltage produces specified voltage bias conditionsby inducing the voltage for a circuit utilizing a time varying magneticfield which is fixed with respect to said circuit.
 28. A system asclaimed in claim 27, wherein an electrical field which is represented bysaid induced voltage is based on Faraday's law setting forth that saidvoltage which is induced by a time rate of change of a magnetic fieldfor said circuit which is fixed with respect to said magnetic field. 29.A system as claimed in claim 26, wherein said induced voltage isobtained at a top layer of said mask which is positioned on said wafer;and connections are made to said at least one chip by said mask foreffectuating said burn-in without interference with the normal operationof said at least one semiconductor chip.
 30. A system as claimed inclaim 27, wherein said circuit comprises a loop defining an area on awafer, said mask being positioned on said wafer so as to enclose saidarea and having electrical contacts for an induced voltage through saidtime varying magnetic field within said enclosed area.
 31. A system asclaimed in claim 30, wherein said loop comprises a metallic line on saidwafer forming an open circuit having electrical contact points providedat open ends of said circuit for producing said induced voltage.
 32. Asystem as claimed in claim 31, wherein said loop is of a rectangularconfiguration to define a generally rectangular area on said wafer. 33.A system as claimed in claim 31, wherein said metallic line isconstituted of copper.
 34. A system as claimed in claim 31, wherein saidmetallic line is constituted of aluminum.
 35. A system as clamed inclaim 27, wherein said circuit comprises a circular magnetic core havingan air gap for receiving said wafer with said at least one chip and saidmask positioned thereon; and an electrical coil for energizing saidmagnetic core to produce said specified voltage bias conditions.
 36. Asystem as claimed in claim 35, wherein said voltage is supplied to saidelectrical energizing coil from a radio frequency voltage source.
 37. Asystem as claimed in claim 36, wherein said circular magnetic core isconstituted of a Permalloy powder having a composition 2% by weight ofMo, 81% by weight of Ni with the remainder being iron and impurities.38. A system as claimed in claim 35, wherein said air gap receiving saidwafer and mask is adapted to provide for the burn-in of differentlysized wafers.
 39. A system as claimed in claim 35, wherein saidelectrical energizing coil consists of an isolated electrical wirecomprised of copper wire strands.
 40. A system as claimed in claim 35,wherein said wafer and mask are retained in said air gap by a waferholder consisting of a dielectric material.
 41. A system as claimed inclaim 35, wherein said magnetic core includes a plurality of saidcircular magnetic cores interconnected by arms, and each said corehaving an air gap for receiving respectively a wafer and covering maskso as to facilitate the simultaneous controlled burn-in of a pluralityof said wafers.
 42. A system as claimed in claim 27, wherein arectangular core of non-magnetic material has electrical wire coilswound thereabout, said wire coils being connected to decal masks on aplurality of wafers positioned centrally on said core, each said decalmask being provided to conduct a generated voltage to a chip under saidmask.
 43. A system as claimed in claim 42, wherein each said coil isconducted to a time varying voltage source so as to generate a magneticfield perpendicular to the surface of each said wafer in the center ofsaid non-magnetic core.
 44. A system as claimed in Clam 43, whereinelectrical wires extend from each said mask to a panel for the directmeasurements and verification of the direct voltages present on each ofsaid wafer.
 45. A system as claimed in claim 42, wherein saidnon-magnetic core is constituted of wood.
 46. A system as claimed inclaim 42, wherein at least nine wafers are positioned on each core forsimultaneous burn-in thereof.
 47. A system as claimed in claim 26,wherein said mask comprises an interposer forming a decal on said wafersurface so as to protect the surface of said wafer from direct contactwith a probe during burn-in and voltage screening through electricalstressing.
 48. A system as claimed in claim 47, wherein said methodconducts the generated burn-in voltage to said at least one chip whenmountable on P+silicon substrates.
 49. A system as claimed in claim 47,wherein said method conducts the generated burn-in voltage to said atleast one chip when mountable on P−silicon substrates.
 50. A system asclaimed in claim 47, wherein said interposer is formed for mounting thewafer on either P+silicon or P−silicon substrates by means of: fixing apolyimide film to a frame to fully cover said wafer; depositing at leaston layer of a metallic film onto the polyimide film; patterning saidmetallic film to provide wiring lines extending to the edge of saidwafer to facilitate measuring the induced voltage; removing exposedmetallic layer material at the bottom of the vias and depositing afurther wiring line layer forming a ring wire loop on said wafer whichis connected to said first wiring lines to facilitate applying anelectrical bias to each said ring wire loop; placing lead/tin bumps intoeach of said vias and connecting said bumps to said further wiringlines; and adjusting bump heights whereby the pattern of the bumpsinteriorly of the decal mask is a mirror-image of wire bond pads or C4connects on the wafer chip which is to be burned-in.